Goldmane, Annija Elizabete; Avotina, Liga; Vanags, Edgars; Trimdale-Deksne, Aija; Zaslavskis, Aleksandrs; Kizane, Gunta; Dekhtyar, Yuri (IOP Publishing, 2023)
Physical vapor deposition (PVD) of metallic thin films is used extensively in the fabrication of semiconductor technology devices - use as of lately for them have grown. Tungsten (W) is a low resistivity, refractory metal, ...
