Enhancement of photosensitivity in azo-epoxy resists for direct holographic recording

Abstract

Azo-epoxy resist is promising material for direct holographic recording due to good photosensitivity and possibility to modify structure of molecule during synthesis – obtained polymer polymerization index easily can be changed by varying curing temperature and curing time. Produced photoresist had properties similar to low-weight molecular glasses. In this work 4-Aminoazobenze, Disperse Orange 2 and epoxy resin bisphenol A diglycidyl ether were used. Surface relief grating formation by direct holographic method was performed in obtained resi sts. Surface relief grating post-recording self-enhancement process was investigated. It allows to increase a depth of surface relief grating after holographic recording, using physical method – uniform light illumination. It decreases time and required exposure for recording, making holographic recording more effective because grating formation is less affected by vibrations and noises.