Browsing B6 – LU institūti un aģentūras / Institutes and agencies of the UL by Subject "Atomic layer deposition"
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Hardness and modulus of elasticity of atomic layer deposited Al2O3-ZrO2 nanolaminates and mixtures
(Elsevier B.V., 2020)Atomic layer deposition was used to produce 90–105 nm thick alumina-zirconia mixtures and nanolaminate structures on soda-lime glass substrate. The resultant chemical and structural compositions of the thin films were ...